Lam Research Corp. has rolled out what it claims is an advanced plasma conductor etch tool needed for 3D chipmaking. Called ...

New Lam Research tools Akara and ALTUS Halo for building AI chips offer advanced plasma etch and ALD capabilities for complex ...

The Korea Research Institute of Standards and Science (KRISS) has successfully developed a system that diagnoses the lifetime ...

Akara extends decades of Lam leadership in conductor etch. This includes multiple generations of the company's highly ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

A research team has successfully developed a new composition and processing technology for transparent plasma-resistant ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), ...

Researchers from the University at Buffalo, Central South University, Shandong Normal University, Sungkyunkwan University, TU ...

3D NAND flash memory is different from traditional single-layer NAND because it vertically stacks memory cells to cram more ...

Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced ...