The Korea Research Institute of Standards and Science (KRISS) has successfully developed a system that diagnoses the lifetime ...

Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced ...

Plasma etching and atomic layer etching (ALE) are critical processes in the fabrication of semiconductor devices, particularly as the industry moves towards smaller and more complex structures.

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

A research team has successfully developed a new composition and processing technology for transparent plasma-resistant ...

Researchers find a faster way to etch deep holes for 3D NAND Plasma-based cryo-etching technique doubles etch speed, ...

Standard NAND flash storage is used in microSD cards, USB drives, and solid-state drives in computers and phones. To fit more gigabytes into smaller spaces, manufacturers ...

Researchers from the University at Buffalo, Central South University, Shandong Normal University, Sungkyunkwan University, TU ...

The photon detection technique has several applications. Fractal superconducting nanowire single-photon detectors (SNSPDs) ...