Source: Lam Research Used for several decades, etch is an essential process in the fab. In a simple process flow, a system deposits silicon dioxide materials on a wafer. A lithography system then ...

After removing the bulk of the material, Ken uses a product called Armor Etch to remove some silicon dioxide. Armor Etch apparently comes from craft stores, used to etch glassware with silhouettes ...

The bits left in shadow stay soft. When an etching chemical is applied those soft parts, and the silicon dioxide underneath them, are removed. The hard photoresist is then dissolved, leaving a ...

For example, chlorine-based gases are commonly used for etching silicon, while fluorine-based gases are used for etching silicon dioxide and nitride. Wet etching involves the use of liquid chemical ...

More information: Thorsten Lill et al, Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride, Journal of Vacuum Science & Technology A (2024). DOI: 10.1116/6.0004019 ...