Lam Research Corporation LRCX continues to ride strong momentum in its systems business, driven by customer demand for its ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next ...

Haozhe "Harry" Wang, assistant professor of electrical and computer engineering (ECE) at Duke University and an expert in developing new methods for manufacturing materials, continues to push the ...

The discovery was partially accidental, as researchers happened upon it while looking at using high-energy plasma etching to machine the surface of wood in order to improve it’s water resistance.

In the semiconductor manufacturing process, etching equipment can be regarded as the core equipment, and ceramic cavities are ...

A research group at Nagoya University in Japan has developed a new method called “wet-like plasma etching” that combines the key features of two existing techniques: wet etching and dry ...

Samsung's patent says that a dry etching apparatus using plasma is suitable for fabricating circuits with a width of 0.15 micrometers or less. The company concludes that dry etching is the ...

Using C5HF7/O2/Ar plasmas, plasma etching of SiO2 films with high selectivity against SiN films was achieved in comparison with traditional C5F8/O2/Ar plasmas. The results of the analysis showed that ...