The findings of the experiment are listed below: For pressures less than 50 mTorr anisotropic etching was observed. The photoresist selectivity of the chlorine-based process was just 1.5:1 at lower ...

The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride. To ...

You have to exceed a certain energy to etch a material. If you can select the energy of the ions to be between the thresholds of silicon and silicon dioxide, for example, you can etch silicon and ...

Silicon is the best-known semiconductor material. However, controlled nanostructuring drastically alters the material's properties. Using a specially developed etching apparatus, a team at HZB has ...

Phosphorus trifluoride acted as a nitrous boost for silicon dioxide etching, quadrupling the rate. They also tested ammonium fluorosilicate. The team detailed its findings in a study published in ...

Plasma etching processes can be roughly grouped as dielectric, silicon or conductor etches. Dielectrics such as silicon dioxide and silicon nitride are best etched using fluorinated gases while ...

When the etching is done, the metal can be cleaned from the surface ... As gate lengths shrink smaller than 14 nanometers, the silicon dioxide insulator used in conventional transistors fails to ...

Even the cleverest, most cunning artificial intelligence algorithm will presumably have to obey the laws of silicon ... features built into GPUs—or etching new ones into future chips—to ...

The researchers also studied the impact of phosphorus trifluoride, an essential ingredient when etching silicon dioxide at any significant degree. While it has been used before, the researchers ...